JSM-IT510 InTouchScope

Analytical SEM with automated functions, embedded EDS, large chamber, Live Analysis, Zeromag navigation

• Status: Active
• Country: Japan
• Analyte Type / Target Of Analysis: Morphology and microstructure
• Vibration / Magnetic / Noise Tolerance
  : AC field ≤0.3 μT
• Electron Gun Type
  : Thermionic source (W)
• Standard Detectors [EM]
  : Secondary electron (SE), backscattered electron detector (BED) in LV/LA types
• Optional Detectors [EM]: EDS, WDS, EBSD, LHSED, Load Lock Chamber, 3D analysis software
• Cryo
  : Optional
• Additional Analytical Capabilities
  : Embedded EDS, Live Analysis, Particle Analysis, Asbestos, Gun Shot Residue, Fractography
• Electron Optics
  : High and low vacuum modes, large eucentric stage, 11 ports for simultaneous detectors
• Resolution [EM]
  : 3.0 nm (30 kV) in high vacuum, 4.0 nm (30 kV BED) in low vacuum
• Electron Beam Resolution
  : 3.0–4.0 nm depending on vacuum mode
• Beam Current
  : 1 pA to 1 μA
• Image Parameters
  : SE, BE, compositional image, topographic image, PD image, Live 3D, Montage, Zeromag
• Magnification
  : Photo: ×5 to ×300,000; Display: ×14 to ×839,724
• Chamber
  : 200 mm dia. × 75–90 mm tall specimens
• Camera Details
  : Image sizes: 640×480 up to 5120×3840; 23.8” touch monitor
• Stage Parameters
  : X: 125 mm, Y: 100 mm, Z: 80 mm, Tilt: –10° to 90°, Rotation: 360°
• Holder Types: Multiple including cryo and tilting types
• Sample Size: Max 200 mm dia. × 75 mm or 90 mm tall
• Vacuum System
  : Fully automatic, TMP + RP
• Power Specifications: Single-phase 100 V AC, 50/60 Hz, 3.0 kVA
• Environmental Specifications: 20 ±5 °C, humidity ≤60%, height ≤2,000 m, AC field ≤0.3 μT
• Physical Specifications: EOS: 750×1,000×1,470 mm, 405 kg; RP: 530×230×320 mm, 23 kg