IMS Wf

High-precision magnetic SIMS for ultra-shallow depth profiling, 300mm wafer mapping.

• Status: Active
• Country: France
• Isotopic: Yes
• Elemental: Yes
• Analyte Type / Target Of Analysis: Most of elements, isotopes, and molecular species
• Measurable Isotopes/Elements: B, P, As, Sb, O, N, H, Si, Ge, Mg, In, Al, etc.
• Analyzer Type
  : Magnetic Sector MS
• Ion Source Type: Dual: Cs⁺ (60°) and RF-plasma O₂⁺ (36°) columns
• Inlet Types: Direct wafer loading, robot transfer
• High Resolution
  : Yes
• Mass Resolution/ Mass Resolving Power
  : Up to 10,000 (MRP), typically 6000 at FWHM
• Collectors Qty
  : 1 (Faraday + Electron Multiplier)
• Sensitivity
  : Sub-ppm; high for light elements and dopants
• Dynamic Range
  : >6 orders of magnitude
• Detection Limits
  : ~10–100 ppt for key elements
• Precision
  : Sub-percent precision; <0.3% dose variation in wafer mapping
• Detector Type
  : Dual detection: Faraday cup and Electron Multiplier
• Primary Beam [SIMS]
  : 100 eV to 13 keV (Cs⁺), 100 eV to 10 keV (O₂⁺)
• Spatial Resolution
  : Sub-micron profiling with precise positioning
• Geometry Type
  : Double-focusing magnetic sector geometry
• Vacuum System
  : 2 turbo pumps + 1 forepump; analytical chamber at 10⁻¹⁰ mbar
• Physical Specifications: 1450 × 780 × 1550 mm