HF5000

200 kV aberration-corrected TEM/STEM. Sub-angstrom imaging with 0.078 nm STEM resolution. Integrated dual SDD EDX and in-house Cs corrector

• Status: Active
• Country: Japan
• Analyte Type / Target Of Analysis: Morphology and microstructure
• Vibration / Magnetic / Noise Tolerance
  : Must consult Hitachi for site vibration, acoustic noise, magnetic flux
• Electron Gun Type
  : Cold FEG
• Optional Detectors [EM]: EDX, Screen camera, Gatan controller, STEM camera
• Cryo
  : Optional
• STEM
  : Yes
• STEM Parameters: ADF-STEM resolution 0.078 nm
• Additional Analytical Capabilities
  : EDX, STEM, TEM, SE imaging
• Electron Optics
  : In-house aberration corrector, symmetrical dual EDX, single objective lens configuration
• Resolution [EM]
  : STEM: 0.078 nm (ADF-STEM), TEM: 0.102 nm (lattice image)
• Electron Beam Resolution
  : 0.078–0.102 nm
• Image Parameters
  : STEM, TEM, SE imaging, EDX
• Magnification
  : STEM: ×20 to ×8,000,000; TEM: ×100 to ×1,500,000
• Camera Details
  : Retractable camera, optional screen camera
• Stage Parameters
  : Eucentric 5-axis goniometer stage; X/Y: ±1 mm, Z: ±0.4 mm, α: ±25°, β: ±35°
• Holder Types: Hitachi double-tilt specimen holder
• Sample Size: 3 mm diameter
• Aberration Correction Type
  : Probe-forming spherical aberration corrector (Hitachi in-house)
• Cooling System
  : Cooling water recirculator: 5.1–5.3 L/min and 2.0–2.2 L/min at 16–18 °C
• Vacuum System
  : Evacuation power supply, dry pump, air compressor
• Power Specifications: Main: Single phase AC200–240 V, 50/60 Hz, 10 kVA; Recirculator: 3-phase 200 V, 30 A
• Environmental Specifications: 15–23 °C, ±0.2 °C/h; ≤60% RH
• Physical Specifications: Main unit: 1678×1970×3157 mm, 2710 kg; total weight (multiple modules)