Specifications

  • Category: Microscopy and Imaging
  • Technique: SEM
  • Manufacturer: Attolight
  • Country: Switzerland
  • Available: Active
All specifications

About

Short description

Hybridized SEM-spectroscopic platform; enables SEM, CL, PL, Pump & Probe, EBIC/EBAC/RCI; designed for static and dynamic modes

Specifications

Hybridized SEM-spectroscopic platform; enables SEM, CL, PL, Pump & Probe, EBIC/EBAC/RCI; designed for static and dynamic modes

  • Status: Active
  • Country: Switzerland
  • Analyte Type / Target Of Analysis: Morphology and microstructure
  • Electron Gun Type
    : Schottky FEG
  • Standard Detectors [EM]
    : PMT, UV-Visible CCD camera, InGaAs NIR detector
  • Optional Detectors [EM]: TCSPC, streak camera, EBIC/EBAC, additional spectrometers, nanoprobes
  • Cryo
    : Optional
  • Additional Analytical Capabilities
    : CL, TRCL, PL, Raman, EBIC/EBAC/RCI, nanoprobes, ultrafast spectroscopy, hyperspectral imaging
  • Electron Optics
    : Achromatic reflective objective; integrated SEM and light microscope with matched focal planes
  • Resolution [EM]
    : Electron spot size: down to 3 nm @ 10 kV
  • Optical Column
    : Achromatic high NA objective (NA = 0.71, f/0.5)
  • Electron Beam Resolution
    : 3 nm @ 10 kV
  • Beam Current
    : 30 pA to 100 nA
  • Image Parameters
    : SEM image + hyperspectral/panchromatic map; pixel time: <10 ps (TRCL); up to 4 detectors/system
  • Chamber
    : High-vacuum stainless steel (10⁻⁷ mbar)
  • Camera Details
    : High-speed UV-Vis CCD, InGaAs NIR camera, PMT; optional streak, TCSPC
  • Stage Parameters
    : 6-DOF nanopositioning stage; 25 mm XY, 3 mm Z, ±3° tilt, ±10° rotation; increment 1 nm
  • Holder Types: Nanostage for 1” sample; wafer stage for 150 mm wafers
  • Sample Size: Up to 50 mm diameter, 1.5 mm thick (nanostage); up to 150 mm wafer (wafer stage)
  • Aberration Correction Type
    : Achromatic reflective optics; high NA lens (0.71) for optimized collection
  • Cooling System
    : Optional cryostage (10 K)
  • Vacuum System
    : High vacuum (10⁻⁷ mbar), loadlock for sample entry

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